Cleanroom Facility Manager

Date Posted: Thursday, June 21, 2007

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A Facility Manager is sought for a microfabrication cleanroom under construction at Boston College, scheduled for completion in September 2007.

This will be a Class 10,000 facility with Class 1,000 environments. The state-of-the-art 4500 sq. ft. gross cleanroom will offer photolithography, electron bean lithography, dip-pen nanolithography, and more.

The cleanroom manager will work closely with administration and faculty members to facilitate laboratory design, space renovations, facility planning, equipment purchasing and installation

The successful candidate will be expected to bring cleanroom equipment up to operational status and ensure its continued safe operation. He or she will be responsible for training users, establishing standard process recipes, performing regular maintenance, and serving as an internal consultant for the design of various demonstration devices.

The ideal person will have the technical qualifications and communication skills necessary to ensure that the facility meets the needs of its diverse user base.

• Minimum of 5-10 years experience in semiconductor fabrication and cleanroom practice & protocols, preferably working in a facility management capacity.
• Familiarity with Engineering and Physical Science.
• Must have experience in the maintenance of semiconductor processing tools and in the design of recipe-driven processes that can be used by researchers to construct demonstration devices of various types.

Closing Statement
Boston College is an affirmative action, equal opportunity employer. In concert with our Jesuit, Catholic mission, Boston College is dedicated to the goal of building a culturally diverse and pluralistic faculty and staff committed to teaching and working in a multicultural environment and strongly encourages applications from women, minorities, individuals with disabilities and covered veterans.

Please apply before: 07/06/2007

For more information and to apply online please visit our website

Further Information:

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